Basic Science and Challenges in Process Simulation

We intend to turn the reader s attention towards CMOS Complementary Metal Oxide Semiconductor the mainstream semicon ductor technology Within a decade silicon CMOS devices will be atoms long and atoms deep Of billion devices on a chip only may fail This calls for extreme control of atomistic processes We review research topics in basic materials science which are likely to match the needs of CMOS It is noted that a hierarchy of models which adopt meth ods ranging from quantum mechanics through classical and Monte Carlo schemes to easily solvable continuum equations must be constructed